Method and apparatus for recovering indium from etching waste solution containing indium and ferric chloride
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United States of America Patent
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Jul 9, 2013
Grant Date -
Jun 10, 2010
app pub date -
Nov 19, 2007
filing date -
Jan 23, 2007
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Abstract
It is an object to provide a method and an apparatus for recovering indium, the method and apparatus ensuring that it is unnecessary to recover indium in the form of indium hydroxide, indium can be recovered easily by a filter or the like without handling inferiors and also, the recovery rate of indium is greatly improved. The method includes immersing a precipitation-inducing metal which includes zinc and is made into the form of a solid such that any part coming into view three-dimensionally has a longitudinal length of 2.5 to 10 mm in an etching waste solution containing at least indium and ferric chloride and allowed to stand, thereby allowing indium contained in the etching waste solution to precipitate on the surface of the precipitation-inducing metal based on a difference in ionization tendency between zinc and indium, and detaching the indium precipitated on the surface of the precipitation-inducing metal to recover it.
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