Pulsed laser source with high repetition rate

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United States of America Patent

PATENT NO 8467424
APP PUB NO 20130003032A1
SERIAL NO

13135290

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Abstract

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Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.

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Patent Owner(s)

Patent OwnerAddress
ANVIK CORPORATION6 SKYLINE DRIVE HAWTHORNE NY 10532-2165

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jain, Kanti Hawthorne, US 75 2453

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