System and method for introducing a substrate into a process chamber
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United States of America Patent
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Jun 11, 2013
Grant Date -
Jun 17, 2010
app pub date -
Feb 25, 2010
filing date -
Nov 29, 2006
priority date (Note) -
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Abstract
A system and method for introducing a substrate into a process chamber is provided. A presence or absence of a substrate on a stage in an apparatus for manufacturing a semiconductor or a flat panel display may be determined by lift pins used for loading and unloading a substrate, the introduction of another substrate may be prevented and a broken state or the erroneously loaded state of the substrate may be detected. An opening or closing of a gate valve may also be determined, and the introduction of a substrate into the process chamber may be prevented while the gate valve is closed.
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