Dual hexagonal shaped plasma source
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United States of America Patent
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Jun 4, 2013
Grant Date -
Jan 17, 2008
app pub date -
Jul 14, 2006
filing date -
Jul 14, 2006
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Abstract
A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cathode.
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