Cleaning method and method for manufacturing electronic device

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United States of America Patent

PATENT NO 8454754
APP PUB NO 20080196743A1
SERIAL NO

12028288

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Abstract

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A cleaning method includes: producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning a workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece. A method for manufacturing an electronic device includes: producing a workpiece; producing an oxidizing solution by electrolysis of sulfuric acid; and cleaning the workpiece with the oxidizing solution. The oxidizing solution is heated by heat of mixing to clean the workpiece.

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Patent Owner(s)

Patent OwnerAddress
DE NORA PERMELEC LTD2023-15 ENDO FUJISAWA-SHI KANAGAWA 2520816 ?2520816

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayamizu, Naoya Kanagawa-ken, JP 56 460
Kato, Masaaki Okayama-ken, JP 138 1740
Kobayashi, Nobuo Kanagawa-ken, JP 144 1838
Shibata, Yukihiro Fukuoka-ken, JP 114 1741

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  • 5 Citation Count
  • B08B Class
  • 8.06 % this patent is cited more than
  • 12 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges45383792886512101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8091 - 1000255075100125150175200225250275300325350375400425

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