Molybdenum-containing targets comprising three metal elements
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United States of America Patent
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May 28, 2013
Grant Date -
Jan 5, 2012
app pub date -
Jun 30, 2010
filing date -
Jun 30, 2010
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Abstract
The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.
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