Method to alter silicide properties using GCIB treatment

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May 7, 2013
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Sep 20, 2012
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May 29, 2012
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Nov 16, 2009

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Abstract

A method of manufacturing a semiconductor device is described. The method comprises performing a gas cluster ion beam (GCIB) pre-treatment and/or post-treatment of at least a portion of a silicon-containing substrate during formation of a silicide region.

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TEL EPION INC	BILLERICA MASSACHUSETTS 01821

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Gumpher, John	Niskayuna, US	9	123
Hautala, John J	Beverly, US	60	1845
Russell, Noel	Waterford, US	34	296

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Method to alter silicide properties using GCIB treatment

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United States of America Patent

13482550

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PATENT NO	8435890
APP PUB NO	20120238092A1
SERIAL NO	13482550
DOCKET NO

US Family Size	Non-US Coverage
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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 07, 2013	US,8435890,B2 US8435890B2	GRANTED PATENT AS SECOND PUBLICATION
September 20, 2012	US,20120238092,A1 US20120238092A1	FIRST PUBLISHED PATENT APPLICATION

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