Apparatus and method for coating a substrate
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United States of America Patent
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May 7, 2013
Grant Date -
Nov 13, 2008
app pub date -
Apr 27, 2006
filing date -
May 31, 2005
priority date (Note) -
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Abstract
An apparatus for coating a substrate using physical vapor deposition, including a vacuum chamber wherein a coil is placed for keeping an amount of conductive material in levitation and for heating and evaporating that material, using a varying electric current in the coil. Isolating member are placed in the coil to isolate the coil from the levitated material. The isolating member is part of a container made of non-conductive material. The container has one or more openings for guiding evaporated conductive material to the substrate to be coated. A method for coating a substrate using physical vapor deposition is also presented.
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