Process and method for modifying polymer film surface interaction
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United States of America Patent
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Apr 23, 2013
Grant Date -
Jun 24, 2010
app pub date -
Dec 10, 2009
filing date -
Dec 19, 2008
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Abstract
The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process.
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