Projection exposure apparatus and projection exposure method
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United States of America Patent
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Apr 16, 2013
Grant Date -
Aug 5, 2010
app pub date -
Jan 17, 2008
filing date -
Jan 22, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
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