Plasma processing apparatus
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United States of America Patent
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Apr 9, 2013
Grant Date -
Jul 28, 2011
app pub date -
Apr 7, 2011
filing date -
Aug 5, 2005
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Abstract
A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.
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