Asymmetric surface texturing for use in a photovoltaic cell and method of making
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United States of America Patent
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Apr 2, 2013
Grant Date -
Jul 7, 2011
app pub date -
Mar 16, 2011
filing date -
May 30, 2008
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Abstract
A novel surface texturing provides improved light-trapping characteristics for photovoltaic cells. The surface is asymmetric and includes shallow slopes at between about 5 and about 30 degrees from horizontal as well as steeper slopes at about 70 degrees or more from horizontal. It is advantageously used as either the front or back surface of a thin semiconductor lamina, for example between about 1 and about 20 microns thick, which comprises at least the base or emitter of a photovoltaic cell. In embodiments of the present invention, the shallow slopes are formed using imprint photolithography.
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