Metal processing method, manfacturing method of metal mask and manufacturing method of organic light emitting display device
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United States of America Patent
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Mar 26, 2013
Grant Date -
Feb 3, 2011
app pub date -
Jul 27, 2010
filing date -
Jul 29, 2009
priority date (Note) -
Expired
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Abstract
In a metal processing method, a photoresist liquid is applied to both surfaces of a metal plate (210) to form photoresist films (220, 230), respectively (Step S102). Subsequently, the photoresist films (220, 230) are exposed and developed so that the photoresist films (220, 230) is removed while leaving the photoresist films (220, 230) corresponding to portions in which a hole is to be formed (Step S103). Next, metal thin films (240, 250) are formed on both the surfaces of the metal plate (210), respectively, on which the photoresist films (220, 230) are formed (Step S104). Subsequently, the photoresist films (220, 230) are removed, and metal thin films (245, 255) are also removed, which are formed on the photoresist films (220, 230), respectively (Step S105). Finally, the metal plate (210) is immersed in an etchant to be etched, to thereby form a high-precision hole in the metal plate (210) (Step S106).
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