In-situ cleaning of an imprint lithography tool

United States of America Patent

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Mar 12, 2013
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Apr 8, 2010
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Sep 21, 2009
filing date
Oct 2, 2008

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Abstract

Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

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Patent Owner	Address
CANON NANOTECHNOLOGIES INC	PO BOX 81536 AUSTIN TX 78708

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B08B:CLEANING IN GENERAL; PREVENTION OF FOULING IN GENE....

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Byung-Jin	Austin, US	194	2163
McMackin, Ian Matthew	Austin, US	20	191
Resnick, Douglas J	Leander, US	42	457
Schmid, Gerard M	Austin, US	35	341

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In-situ cleaning of an imprint lithography tool

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United States of America Patent

12563356

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PATENT NO	8394203
APP PUB NO	20100085555A1
SERIAL NO	12563356
DOCKET NO

US Family Size	Non-US Coverage
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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 12, 2013	US,8394203,B2 US8394203B2	GRANTED PATENT AS SECOND PUBLICATION
April 08, 2010	US,20100085555,A1 US20100085555A1	FIRST PUBLISHED PATENT APPLICATION

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