Method and apparatus for the measurement of atmospheric leaks in the presence of chamber outgassing
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United States of America Patent
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Mar 12, 2013
Grant Date -
Jan 28, 2010
app pub date -
Jul 24, 2009
filing date -
Jul 24, 2008
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Abstract
Embodiments of the present invention employ measurement of argon as the means to detect the presence of an atmospheric leak in a processing chamber. Argon detected inside the process chamber is conclusive evidence of a leak. Furthermore, the amount of detected argon provides information on the rate of air entering through the leak. In one embodiment, leak detection takes place in the main plasma inside the processing chamber. In another embodiment, leak detection takes place in the self-contained plasma generated in a remote plasma sensor. Additional measurements can be performed, such as measuring the amount of oxygen, and/or the presence of moisture to help in detecting and quantifying outgassing from the processing chamber.
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