Molecular bonding method with cleaning with hydrofluoric acid in vapor phase and rinsing with deionized water
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United States of America Patent
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Feb 26, 2013
Grant Date -
Aug 21, 2008
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Feb 8, 2008
filing date -
Feb 19, 2007
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Expired
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Abstract
Adhesion by molecular bonding of two free surfaces of first and second substrates, for example formed by monocrystalline silicon wafers, comprises at least successively:
- a cleaning step of the two free surfaces with hydrofluoric acid in vapor phase to make the two free surfaces hydrophobic,a rinsing step of said free surfaces with deionized water with a time less than or equal to 30 secondsa step of bringing said free surfaces into contact.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
COMMISSARIAT A L'ENERGIE ATOMIQUE | 75015 PARIS |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Fournel, Frank | Villard-Bonnot, FR | 65 | 226 |
# of filed Patents : 65 Total Citations : 226 | |||
Morales, Christophe | Saint Pierre de Mesage, FR | 27 | 210 |
# of filed Patents : 27 Total Citations : 210 | |||
Moriceau, Hubert | Saint Egreve, FR | 93 | 2315 |
# of filed Patents : 93 Total Citations : 2315 | |||
Perreau, Pierre | Grenoble, FR | 4 | 9 |
# of filed Patents : 4 Total Citations : 9 |
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- 12 Age
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent No: 8382933
Molecular bonding method with cleaning with hydrofluoric acid in vapor phase and rinsing with deionized water
Abstract
Adhesion by molecular bonding of two free surfaces of first and second substrates, for example formed by monocrystalline silicon wafers, comprises at least successively:
- a cleaning step of the two free surfaces with hydrofluoric acid in vapor phase to make the two free surfaces hydrophobic,a rinsing step of said free surfaces with deionized water with a time less than or equal to 30 secondsa step of bringing said free surfaces into contact.
Description
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Legal Events
Date | Code | Event | Description |
---|---|---|---|
Mar 27, 2017 | STCH | INFORMATION ON STATUS: PATENT DISCONTINUATION | free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
Feb 26, 2017 | FP | LAPSED DUE TO FAILURE TO PAY MAINTENANCE FEE | Effective Date: Feb 26, 2017 |
Feb 26, 2017 | LAPS | LAPSE FOR FAILURE TO PAY MAINTENANCE FEES | |
Oct 07, 2016 | REMI | MAINTENANCE FEE REMINDER MAILED | |
Feb 26, 2013 | I | Issuance | |
Aug 21, 2008 | P | Published | |
Feb 12, 2008 | AS | ASSIGNMENT | free format text: CORRECTIVE ASSIGNMENT TO CORRECT ASSIGNEE ADDRESS PREVIOUSLY RECORDED ON REEL 020665 FRAME 0817;ASSIGNORS:FOURNEL, FRANK;MORICEAU, HUBERT;MORALES, CHRISTOPHE;AND OTHERS;REEL/FRAME:020831/0384 Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE, FRANCE Effective Date: Feb 12, 2008 |
Feb 12, 2008 | AS | ASSIGNMENT | free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:FOURNEL, FRANK;MORICEAU, HUBERT;MORALES, CHRISTOPHE;AND OTHERS;REEL/FRAME:020665/0817 Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE, FRANCE Effective Date: Feb 12, 2008 |
Feb 08, 2008 | F | Filing | |
Feb 19, 2007 | PD | Priority Date |

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