Use of spectroscopic techniques to monitor and control reactant gas input into a pre-pump reactive gas injection system
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United States of America Patent
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Feb 26, 2013
Grant Date -
Dec 31, 2009
app pub date -
Nov 23, 2005
filing date -
Nov 23, 2005
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Abstract
The present invention relates to vacuum processing systems in which process gases are introduced in a process chamber and are exhausted through a vacuum processing system exhaust path. Deposits made by the exhausted gas are reduced or eliminated by introducing a reactive gas upstream of the device affected by deposits. The amount of introduced reactive gas is controlled by measuring gas phase concentrations of exhausted gas components upstream and downstream of the affected device, and, from those measurements, determining whether the components are being consumed in deposits on the affected device.
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