Electrodeposition coating material and electrodeposition method

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United States of America Patent

PATENT NO 8372257
APP PUB NO 20100108533A1
SERIAL NO

12451336

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Abstract

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A suspension type electrodeposition coating composition containing, as a resin component, block copolyimide having a siloxane bond in a molecular structure and an anionic group in a molecule. Preferably, the above-mentioned block copolyimide contains, as one of the diamine components, diamine having a siloxane, bond in a molecular structure. In addition, preferably, the above-mentioned anionic group is a carboxylic acid group or a salt thereof and/or a sulfonic acid group or a salt thereof. The electrodeposition coating composition has superior heat resistance, which does not easily develop peeling and cracks in the electrodeposited body, and is capable of efficiently forming a high-insulation electrodeposited film superior in the uniformity of film property.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION3-2 OTEMACHI 1-CHOME CHIYODA-KU TOKYO 100-8117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Masanori Amagasaki, JP 41 155
Goshima, Toshiyuki Yokohama, JP 20 61
Honjo, Hiromasa Amagasaki, JP 4 21
Ishii, Kiyoshi Yokohama, JP 42 578
Nagato, Toyokazu Amagasaki, JP 3 9
Nakajima, Shintaro Yokohama, JP 22 55
Win, Maw Soe Yokohama, JP 16 58
Zushi, Toshihiro Amagasaki, JP 13 133

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