Metal chalcogenide aqueous precursors and processes to form metal chalcogenide films
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 5, 2013
Grant Date -
Aug 25, 2011
app pub date -
Feb 22, 2010
filing date -
Feb 22, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Metal chalcogenide precursor solutions are described that comprise an aqueous solvent, dissolved metal formate salts and a chalcogenide source composition. The chalcogenide source compositions can be organic compounds lacking a carbon-carbon bond. The precursors are designed to form a desired metal chalcogenide upon thermal processing into films with very low levels of contamination. Potentially contaminating elements in the precursors form gaseous or vapor by-products that escape from the vicinity of the product metal chalcogenide films.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully