Gas distributor with pre-chambers arranged in planes
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United States of America Patent
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Jan 8, 2013
Issued Date -
N/A
app pub date -
Jan 5, 2006
filing date -
Jan 31, 2005
priority date (Note) -
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Abstract
A gas distributor for a CVD or OVPD reactor comprises two or more gas volumes (1, 2) into each of which opens a feed pipe (3, 4) for a process gas, each gas volume (1, 2) being connected to a plurality of corresponding process gas outlets (6, 7) which open into the bottom (5) of the gas distributor. In order to increase the homogeneity of the gas composition, the two gas volumes (1, 2) comprise pre-chambers (10, 10′, 11) located in a first common plane (8) and a plurality of gas distribution chambers (12, 13) each associated with a gas volume are provided in a second plane (9′) adjacent to the bottom of the gas distributor. The pre-chambers (10, 10′, 11) and gas distribution chambers (12, 13) associated with each gas volume (1, 2) are connected with connection channels (14, 15).
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