Multi-station plasma reactor with multiple plasma regions
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United States of America Patent
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Dec 25, 2012
Grant Date -
Jun 4, 2009
app pub date -
Dec 20, 2007
filing date -
Nov 30, 2007
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Abstract
A plasma chamber is constructed to have a chamber body defining therein a plurality of process stations. A plurality of rotating substrate holders are each situated in one of the process stations and a plurality of in-situ plasma generation regions are each provided above one of the substrate holders. A plurality of quasi-remote plasma generation regions are each provided above a corresponding in-situ plasma generation region and being in gaseous communication with the corresponding in-situ plasma generation region. An RF energy source is coupled to each of the quasi-remote plasma generation regions.
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