Method for fabricating high aspect ratio nanostructures
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United States of America Patent
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Dec 18, 2012
Grant Date -
Dec 15, 2011
app pub date -
Aug 19, 2011
filing date -
Jun 18, 2008
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Abstract
A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.
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