Sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof

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United States of America Patent

PATENT NO 8334082
APP PUB NO 20110129764A1
SERIAL NO

13055139

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Abstract

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A sensitive liquid crystalline polymeric material suitable for the reflective hologram recording and the preparing method thereof are disclosed. The material includes a base film, a buffer layer coated on one side of the base film, a sensitive polymeric layer coated on the other side of the buffer layer and a protective layer coated on the surface of the sensitive polymeric layer.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI TECHSUN ANTI-COUNTERFEITING TECHNOLOGY HOLDING CO LTDSHANGHAI 200433

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gao, Yun Shanghai, CN 104 1530
Xu, Liangheng Shanghai, CN 8 19
Xu, Xuewen Shanghai, CN 2 2
Yang, Kai Shanghai, CN 283 2593
You, Renshun Shanghai, CH 3 3

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