Multi mode ion source
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 11, 2012
Grant Date -
Nov 19, 2009
app pub date -
May 13, 2009
filing date -
May 16, 2008
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A multi mode ion implantation system, which operates in both an arc discharge mode of operation and a non arc discharge mode of operation, is described. The multi mode ion implantation system may consist of dual ionization volumes forming two ion sources, an arc discharge source and a non arc discharge source, in tandem. The dual chambers and the two sources feed the ion implantation system with material of various species for multi mode, an arc discharge and a non arc discharge operation.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully