Integrated reed switch
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United States of America Patent
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Dec 11, 2012
Grant Date -
Sep 24, 2009
app pub date -
Mar 18, 2009
filing date -
Mar 20, 2008
priority date (Note) -
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Abstract
This invention relates to reed switches, and more particularly to micro-miniaturized reed switches and batch microfabrication techniques used to fabricate micro-miniaturized reed switches. The present invention can provide miniaturized reed switches with more consistent operating parameters, and that can be produced more efficiently than conventional reed switches. The present invention can also provide methods of making miniaturized reed switches using microfabrication techniques. The present invention can use lithographic-based fabrication to enable monolithic construction of a reed switch. Microlithography can repeatedly form micrometer dimensions with tight tolerances over large arrays of devices which, if the patterns are translated into materials appropriate for electromechanical devices, can provide for repeatable and consistent electromechanical operation. For example, tight dimensional control of the gap between two reeds in a reed switch or a reed and a fixed contact can provide consistency of performance between reed switches. Thus, the present invention can allow the commonly regarded reed switch specification of sensitivity, or “Ampere-turns” required to close a reed switch, to be tightly controlled with a commensurate reduction in spread in sensitivity across reed switch production lots.
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