Positive resist processing liquid composition and liquid developer

United States of America Patent

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Dec 4, 2012
Grant Date
Apr 8, 2010
app pub date
Aug 10, 2007
filing date
Aug 10, 2006

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Expired

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Abstract

Disclosed is a positive resist processing liquid composition which is composed of an aqueous solution containing a quaternary ammonium hydroxide represented by the following general formula (I).

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Patent Owner(s)

Patent Owner	Address
KANTO KAGAKU KABUSHIKI KAISHA	2-8 NIHONBASHIHONCHO 3-CHOME CHUO-KU TOKYO 1030023

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Araki, Ryosuke	Kanagawa, JP	45	120
Ishikawa, Norio	Saitama, JP	128	2894
Murakami, Yutaka	Saitama, JP	844	7226
Murata, Taku	Kanagawa, JP	4	6
Saito, Kenji	Kanagawa, JP	306	2143

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Positive resist processing liquid composition and liquid developer

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United States of America Patent

12310054

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PATENT NO	8323880
APP PUB NO	20100086882A1
SERIAL NO	12310054
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 04, 2012	US,8323880,B2 US8323880B2	GRANTED PATENT AS SECOND PUBLICATION
April 08, 2010	US,20100086882,A1 US20100086882A1	FIRST PUBLISHED PATENT APPLICATION

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