Optical compensation devices, systems, and methods
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United States of America Patent
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Dec 4, 2012
Grant Date -
Mar 15, 2012
app pub date -
Nov 18, 2011
filing date -
May 16, 2007
priority date (Note) -
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Abstract
Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first patterned region, the first patterned region and the second patterned region each having a plurality of optically transmissive and optically attenuating regions formed on the mask. An optical compensation region is positioned proximate to at least one of the first patterned region and the second patterned region that is configured to change a phase of the illumination radiation incident on the at least one of the first patterned region and the second region by altering an optical property of the substrate.
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