Method for deposition using pulsed atmospheric pressure glow discharge
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United States of America Patent
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Dec 4, 2012
Grant Date -
Sep 24, 2009
app pub date -
May 24, 2007
filing date -
May 30, 2006
priority date (Note) -
Expired
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Abstract
Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (ton). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.
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