Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
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United States of America Patent
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Nov 27, 2012
Grant Date -
Sep 29, 2011
app pub date -
Feb 17, 2011
filing date -
Jul 13, 2007
priority date (Note) -
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Abstract
A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the device, the droplet source may comprise a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing at least some adjacent droplet pairs to coalesce together prior to reaching the irradiation region. In one implementation, the disturbance may comprise a frequency modulated disturbance waveform and in another implementation, the disturbance may comprise an amplitude modulated disturbance waveform.
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