Immersion platinum plating solution

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United States of America Patent

PATENT NO 8317910
APP PUB NO 20110229734A1
SERIAL NO

12661678

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A platinum plating solution for immersion plating a continuous film of platinum on a metal structure. The immersion platinum plating solution is free of a reducing agent. The plating process does not require electricity (e.g., electrical current) and does not require electrodes (e.g., anode and/or cathode). The solution includes a platinum source and a complexing agent including Oxalic Acid. The solution enables immersion plating of platinum onto a metal surface, a metal substrate, or a structure of which at least a portion is a metal. The resulting platinum plating comprises a continuous thin film layer of platinum having a thickness not exceeding 300 Å. The solution can be used for plating articles including but not limited to jewelry, medical devices, electronic structures, microelectronics structures, MEMS structures, nano-sized or smaller structures, structures used for chemical and/or catalytic reactions (e.g., catalytic converters), and irregularly shaped metal surfaces.

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Patent Owner(s)

Patent OwnerAddress
UNITY SEMICONDUCTOR CORPORATION1050 ENTERPRISE WAY #700 C/O RAMBUS INC SUNNYVALE CA 94089

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cheung, Robin Cupertino, US 71 3148
Kong, Wen Zhong Newark, US 4 67

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