Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings

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United States of America Patent

PATENT NO 8309496
APP PUB NO 20120071361A1
SERIAL NO

13273399

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Abstract

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The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.

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Patent Owner(s)

Patent OwnerAddress
AFFYMETRIX INCSANTA CLARA CA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Diggelman, Martin Nierdorf, CH 12 483
Goldberg, Martin J Saratoga, US 50 1375
Hubbell, Earl A Palo Alto, US 42 2171
McGall, Glenn H Palo Alto, US 95 1953
Morris, MacDonald Felton, US 24 719
Ngo, Nam Quoc Campbell, US 15 492
Rava, Richard P Redwood City, US 134 13046
Tan, Jennifer Newark, US 12 483
Yamamoto, Melvin Fremont, US 28 300

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