Mask for increased uniformity in ion beam deposition
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United States of America Patent
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Nov 13, 2012
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N/A
app pub date -
Dec 21, 2006
filing date -
Dec 21, 2006
priority date (Note) -
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Abstract
A shaper mask for particle flux includes a central portion extending from a body of the shaper mask along a first axis to block at least a first portion of a particle flux through the shaper mask from a first direction. The mask also includes at least one off-axis portion. Each off-axis portions extends from the body of the shaper mask along a respective second axis different from the first axis. Each off-axis portion is shaped to block a respective second portion of the particle flux traveling through the shaper mask from a second direction different from the first direction.
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