Method of developing a substrate and apparatus for performing the same
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United States of America Patent
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Nov 6, 2012
Grant Date -
Mar 5, 2009
app pub date -
Aug 26, 2008
filing date -
Aug 31, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank.
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