Process for producing a concentrated solution for a photoresist-stripping liquid having low water content

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United States of America Patent

PATENT NO 8299303
APP PUB NO 20100298605A1
SERIAL NO

12863841

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Abstract

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There is provided a process for producing a concentrated solution of quaternary ammonium hydroxide which is characterized in that quaternary ammonium hydroxide in a form of water-containing crystals or of an aqueous solution is mixed with a water-soluble organic solvent selected from the group consisting of glycol ether, glycol and triol and the resulting mixed solution is subjected to a thin-film distillation in vacuo so as to evaporate the low boiling material. In accordance with this process, a concentrated solution of quaternary ammonium hydroxide having low water content is able to be easily produced.

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Patent Owner(s)

Patent OwnerAddress
KNC LABORATORIES CO LTDKOBE HYOGO 650-0047

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirose, Katsutoshi Hyogo, JP 8 47
Kai, Naoshi Hyogo, JP 1 9
Kamasaka, Kimihiro Hyogo, JP 2 25
Koyama, Hiroya Hyogo, JP 5 43
Sasabe, Taro Hyogo, JP 1 9

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