Apparatus and method for indirect surface cleaning
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United States of America Patent
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Oct 23, 2012
Grant Date -
Mar 12, 2009
app pub date -
Nov 24, 2008
filing date -
Aug 9, 2007
priority date (Note) -
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Abstract
Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.
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