Method for production of substrate electrode for plasma processing
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United States of America Patent
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Oct 23, 2012
Grant Date -
Aug 26, 2010
app pub date -
May 30, 2008
filing date -
Jun 1, 2007
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Abstract
A plurality of reference holes are formed in the surface of a first substrate made of a first material, and a plurality of columnar members are each fitted in the reference holes in such a manner that at least a part of each of the columnar members projects from the surface of the first substrate. Subsequently, an electrode surface layer made of a second material is formed on the surface of the first substrate in such a manner that an end portion of each of the columnar members are exposed at the surface and then the columnar members are removed. Thus obtained is a substrate-like electrode including at least an electrode surface layer provided with through holes having a cross section matching a sectional shape of the projecting portion of the columnar members.
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