Optical surface measuring apparatus and method

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United States of America Patent

PATENT NO 8289525
APP PUB NO 20100220337A1
SERIAL NO

12561671

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Abstract

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Disclosed herein is an apparatus and method which is capable of accurately measuring surface status, such as a minute variation in height (the height difference), a protrusion, a depression, surface damage and/or surface roughness, at each point on the surface of the object to be measured in an optical manner. In particular, the present invention provides an optical surface measuring apparatus and method which is capable of accurately measuring the minute surface status of the object to be measured using both a signal from an interferometer and a Focus Error (FE) signal from a Position Sensitive Detector (PSD) in order to overcome the 2π-ambiguity of the conventional interferometers and the limitation of the Focus Error (FE) signal.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRY-UNIVERSITY COOPERATION FOUNDATION SOGANG UNIVERSITY35 BAEKBEOM-RO MAPO-GU SEOUL 121-742

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Kyuman Seoul, KR 6 50
Kim, Jae Hyun Seoul, KR 259 2059
Kim, Kyoung Up Seoul, KR 2 7
Lee, Seung-Yop Seoul, KR 5 6
Park, Young Kyu Incheon, KR 30 242

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