Inspection device and inspection method for the optical examination of object surfaces, particularly of wafer surfaces
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United States of America Patent
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Oct 16, 2012
Grant Date -
Aug 5, 2010
app pub date -
Jan 27, 2010
filing date -
Jan 30, 2009
priority date (Note) -
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Abstract
An inspection device and a method of inspection, for optical examination of object surfaces, particularly wafer surfaces, wherein the object surface is illuminated by a first illumination device and a second illumination device, wherewith the light reflected and/or scattered from irregularities on the object surface is detected by means of a “scattered light detector” operating in the dark field of the first and second illumination devices, and wherewith the object surface is illuminated by a first illumination device and a second illumination device, wherewith the first illumination device has a laser for illuminating a measurement point on the object surface. The second illumination device is disposed (and oriented) to illuminate the same measurement point on the object surface but with a larger image spot, with the use of light of lower coherence and/or with less anisotropy than that of the laser.
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