Debris removal in high aspect structures
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United States of America Patent
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Oct 16, 2012
Grant Date -
Mar 19, 2009
app pub date -
Sep 17, 2007
filing date -
Sep 17, 2007
priority date (Note) -
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Abstract
A method of debris removal is provided. The method includes positioning a nanometer-scaled tip adjacent to a piece of debris on a substrate. The method also includes adhering the piece of debris to the tip. In addition, the method also includes removing the piece of debris from the substrate by moving the tip away from the substrate.
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