Method for purifying chemical added with chelating agent
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United States of America Patent
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Oct 2, 2012
Grant Date -
Apr 1, 2010
app pub date -
Nov 30, 2007
filing date -
Dec 4, 2006
priority date (Note) -
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Abstract
A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.
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