Optimized electrodes for Re-RAM

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United States of America Patent

PATENT NO 8263420
APP PUB NO 20100117069A1
SERIAL NO

12364732

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Optimized electrodes for ReRAM memory cells and methods for forming the same are discloses. One aspect comprises forming a first electrode, forming a state change element in contact with the first electrode, treating the state change element, and forming a second electrode. Treating the state change element increases the barrier height at the interface between the second electrode and the state change element. Another aspect comprises forming a first electrode in a manner to deliberately establish a certain degree of amorphization in the first electrode, forming a state change element in contact with the first electrode. The degree of amorphization of the first electrode is either at least as great as the degree of amorphization of the state change element or no more than 5 percent less than the degree of amorphization of the state change element.

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Patent Owner(s)

Patent OwnerAddress
SANDISK TECHNOLOGIES LLC5080 SPECTRUM DRIVE SUITE 1050W ADDISON TX 75001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Xiying San Jose, US 18 723
Makala, Raghuveer Sunnyvale, US 11 132
Schricker, April Fremont, US 23 856
Schuegraf, Klaus San Jose, US 28 633
Sekar, Depak C Sunnyvale, US 2 6

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