System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
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United States of America Patent
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Aug 21, 2012
Grant Date -
Sep 2, 2010
app pub date -
Mar 30, 2010
filing date -
Feb 14, 2003
priority date (Note) -
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Abstract
A dispenser cathode which is comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, and emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
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