Positive resist composition and a pattern forming method using the same
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United States of America Patent
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Aug 14, 2012
Grant Date -
Feb 22, 2007
app pub date -
Aug 15, 2006
filing date -
Aug 16, 2005
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Abstract
A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method using the same.
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