System and method of eliminating interference for impurities measurement in noble gases
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 7, 2012
Grant Date -
May 21, 2009
app pub date -
Feb 28, 2007
filing date -
Feb 28, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention provides a system and a method of eliminating interference for impurities measurement in noble gases based on emission spectroscopy which provide very stable, sensitive and interference free results. The method mainly relies on the use of a combination of particularly designed means serially connected for cancelling interferences and proper means for correcting linearity issues. The proposed method is particularly advantageous since it offers long-term stability while providing very accurate and reliable results, even at sub-ppb and up to 10,000 ppm levels, whatever the surrounding conditions and the additional impurities that could be present in the gas under analysis.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully