Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program
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United States of America Patent
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Jul 31, 2012
Grant Date -
Oct 23, 2008
app pub date -
Jan 9, 2008
filing date -
Mar 19, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expansion and contraction error coefficient, a rotation error coefficient, a gray-level offset and an image transmission loss ratio are parameters, to calculate each of the parameters by a least-squares method, a forth unit configured to generate a corrected image by shifting a position of the reference image by a displacement amount, based on the each of the parameters, and a fifth unit configured to compare the corrected image with the optical image.
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