Sputtering target and method of fabrication

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United States of America Patent

PATENT NO 8231745
APP PUB NO 20110297536A1
SERIAL NO

13169284

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Abstract

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A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.

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Patent Owner(s)

Patent OwnerAddress
GLOBAL ADVANCED METALS USA INC100 WORCESTER STREET SUITE 200 WELLESLEY HILLS MA 02481

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alexander, P Todd Billerica, US 5 46
Levit, Vladimir Billerica, US 2 32
Wickersham,, Jr Charles E Billerica, US 8 38

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