Polishing apparatus cofigured to simultaneously polish two surfaces of a work
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United States of America Patent
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Jul 17, 2012
Grant Date -
Feb 12, 2009
app pub date -
May 30, 2008
filing date -
Aug 9, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A polishing apparatus to simultaneously polish both surfaces of a work, and includes a pair of stools rotating in opposite directions, a pair of detecting units to detect rotation rates of the stools, a pressurizing unit to compress the work between the pair of the stools, a slurry supply unit to supply a slurry to the stools, and a control unit to reduce, when determining that a frictional force between the polishing surface and the work exceeds a threshold, at least one of a load applied by the pressurizing unit, the rotation rate of the stools, and a supply amount of the slurry.
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