Massively parallel lithography with two-dimensional pen arrays
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United States of America Patent
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Jul 17, 2012
Grant Date -
May 8, 2008
app pub date -
Mar 23, 2007
filing date -
Apr 19, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods.
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