Method of fabricating planar light source

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8216017
APP PUB NO 20090311813A1
SERIAL NO

12545868

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Abstract

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In a method of fabricating a planar light source, a first substrate is formed at first. First electrodes approximately parallel to each other are formed on the first substrate. Sets of first dielectric patterns are formed on the first substrate. Each set of the first dielectric patterns includes at least two first striped dielectric patterns, and each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. A phosphor layer is formed between the first striped dielectric patterns of each set of the first dielectric patterns. A second substrate is formed. The first and second substrates are bound; meanwhile, a discharge gas is injected into the discharge space.

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Patent Owner(s)

Patent OwnerAddress
CPT TECHNOLOGY (GROUP) CO LTD350000 NO 6 RUJIANG WEST ROAD MAWEI DISTRICT FUZHOU CITY FUJIAN PROVINCE FUZHOU CITY FUJIAN PROVINCE 350000

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ai, Chia-Hua Tainan County, TW 5 2
Hsieh, Yu-Heng Taipei, TW 19 12
Huang, Shinn-Haw Taoyuan County, TW 2 2
Ting, Chu-Chi Hualien County, TW 27 233
Yang, Chang-Jung Taoyuan County, TW 2 2

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