Imprint lithography system and method

United States of America Patent

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Jul 10, 2012
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Mar 25, 2010
app pub date
Oct 20, 2009
filing date
May 18, 2006

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Abstract

System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.

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CITIBANK N A	388 GREENWICH STREET NEW YORK NY 10013

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Inventor Name	Address	# of filed Patents	Total Citations
Choi, Byung-Jin	Austin, US	194	2163
GanapathiSubramanian, Mahadevan	Austin, US	18	268
Meissl, Mario Johannes	Austin, US	38	151

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Imprint lithography system and method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12582091

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PATENT NO	8215946
APP PUB NO	20100072652A1
SERIAL NO	12582091
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 10, 2012	US,8215946,B2 US8215946B2	GRANTED PATENT AS SECOND PUBLICATION
March 25, 2010	US,20100072652,A1 US20100072652A1	FIRST PUBLISHED PATENT APPLICATION

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12582091

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